Diagnostic and Modeling Investigations of Pulsed PECVD 


The Wolden group has pioneered the use of pulsed plasma-enhanced chemical vapor deposition (PECVD) as an alternative approach for self-limiting growth, i.e. 1 /pulse, of metal oxides (Ta2O5, Al2O3, ZnO, TiO2). Deposition rates of 10-30 nm/min have been obtained, which will allow us to extend the atomic scale control of ALD to mesocale structure (50 - 1000 nm). Despite the practical success, our understanding of this dynamic process is in its infancy and process development has been empirical.  The goal of this collaborative project is to develop a fundamental understanding of the process through a combination of extensive diagnostics and state of the art computational modeling. The modeling effort is lead by our collaborator Professor Laxminarayan Raja of the University of Texas at Austin. At present graduate student Chris Lange is leading our efforts to introduce a suite of  in situ diagnostics (Langmuir probe, emission spectroscopy, impedance spectroscopy) into one of our reactors and model  the transport phenomena in these reactors.  

Support for this project is being provided by the National Science Foundation's Chemical, Bioengineering, Environmental, and Transport Systems (CBET) organization through award #1033203.