Accelerating Metal Oxide PECVD Development

Plasma-enhanced chemical vapor deposition is a leading technique for metal oxide thin film synthesis. PECVD is employed for a host of oxide films, including dielectrics, transparent conductors, optical coatings, fuel cells, and electrochromics. Little is understood about the behavior of metal precursors in these systems.  PhD candidate Wenli Yang is developing diagnostic and modeling tools to systematically understand these plasma systems. Specifically she is trying to understand how different classes of precursors, e.g. metal halides versus organometallics, perform for these applications.