Recent Publications 


  1. "Dense Carbide/Metal Composite Membranes for Hydrogen Separations Without Platinum Group Metals", S. K. Gade, S. J. Chmelka, S. Parks, J. D. Way, C. A. Wolden, Adv. Mater., in press (2011). Journal Link

  2. "Electrochromic films produced by ultrasonic spray deposition of tungsten oxide nanoparticles",C.-P. Li, A. C. Dillon, C. A. Wolden and R. C. Tenent, Solar Energy Mater. Solar Cells, in press (2011). Journal Link

  3. "Photovoltaic manufacturing: Present status and future prospects", C. A. Wolden, J. Kurtin, J. B. Baxter, I. Repins, S. E. Shaheen, J. T. Torvik, A. A. Rockett, V. M. Fthenakis, E.S. Aydil, J. Vac. Sci. Technol. A 29, 030801 (2011) Journal Link Featured on the cover.

  4. "Activation of hematite nanorod arrays for photoelectrochemical water splitting", R. Morrish, M. Rahman, J. M. D. MacElroy, C. A. Wolden, ChemSusChem, 4, 474-479 (2011). Journal Link

  5. "PECVD synthesis of silica-silicone nanolaminates using a single precursor", R. P. Patel and C. A. Wolden, J. Vac. Sci. Technol. A 29, 021012 (2011). Journal Link

  6. "Synthesis of b-Mo2C Thin Films", C.A. Wolden, A. Pickerell, T. Gawai, S. Parks, J. Hensley, and J. Douglas Way, ACS Appl. Mater. Inter. 3, 517-521 (2011). Journal Link

  7. "Photoelectrochemical performance of anatase TiO2 thin films deposited by self-limiting growth techniques"F. Wang, N. G. Kubala, and C. A. Wolden J. Electrochem. Soc. 157, D432 (2010). Journal Link

  8. "Self-limiting growth of anatase TiO2: A comparison of two techniques"N. G. Kubala and C. A. Wolden Thin Solid Films 518, 3337 (2010). Journal Link

  9. "Pulsed plasma-enhanced chemical vapor deposition of Al2O3-TiO2 nanolaminates" P. C. Rowlette and C. A. Wolden Thin Solid Films 518, 3337 (2010). Journal Link

  10. "Digital control of SiO2-TiO2 mixed metal oxides by pulsed PECVD"P. C. Rowlette and C. A. Wolden ACS Appl. Mater. Inter. 1, 2586 (2009). Journal Link

  11. "Plasma-enhanced atomic layer deposition of anatase TiO2 using TiCl4",  N. G. Kubala, P. C. Rowlette, and C. A. Wolden J. Phys. Chem. C 113, 16307 (2009). Journal Link

  12. "Self-limiting deposition of anatase TiO2 at low temperature by pulsed PECVD", N. G. Kubala, P. C. Rowlette, and C. A. Wolden, Electrochem. Solid-State Lett. 12, H259 (2009). Journal Link

  13. "Digital control of SiO2 film deposition at room temperature", P. C. Rowlette, M. Canon, C. A. Wolden, J. Phys. Chem. C 113, 6906 (2009). Journal Link

  14. "Self-limiting deposition of semiconductor grade ZnO using dimethyl zinc", P. C. Rowlette, C. G. Allen, O. B. Bromley, A. E. Dubetz, and C. A. Wolden, J. Vac. Sci. Technol. A 24, 761 (2009). Journal Link

  15. "Plasma-enhanced atomic layer deposition of semiconductor grade ZnO using dimethyl zinc", P. C. Rowlette, C. G. Allen, O. B. Bromley, A. E. Dubetz, and C. A. Wolden, Chem. Vap. Deposition 15, 15 (2009). Journal Link

  16. "Enhancement of metal oxide deposition rate and quality using pulsed plasma-enhanced chemical vapor deposition at low frequency", M. T. Seman, D. N. Richards, P. C. Rowlette, N. G. Kubala, and C. A. Wolden, J. Vac. Sci. Technol. A 26, 1213 (2008). Journal Link

  17. "An analysis of the deposition mechanisms involved during self-limiting growth of aluminum oxide by pulsed PECVD", M. T. Seman, D. N. Richards, P. Rowlette, and C. A. Wolden, Chem. Vap. Deposition 14, 296 (2008). Journal Link

  18. "Self-limiting deposition of aluminum oxide thin films by pulsed plasma-enhanced chemical vapor deposition", S. F. Szymanski, P. Rowlette, and C. A. Wolden, J. Vac. Sci. Technol. A 26, 1079 (2008). Journal Link

  19. "A comparison of the electrolyte performance of Ta2O5 films deposited by continuous wave and pulsed PECVD", M. T. Seman, J. J. Robbins, D. Leonhardt, S. Agarwal, and C. A. Wolden, J. Electrochem. Soc. 155, J168 (2008). Journal Link

  20. "The effect of wall conditions on the self-limiting growth of metal oxides by pulsed plasma-enhanced chemical vapor deposition", S. F. Szymanski, M. T. Seman, and C. A. Wolden, J. Vac. Sci. Technol. A 25, 1493 (2007). Journal Link

  21. "Plasma and gas-phase characterization of a pulsed plasma-enhanced chemical vapor deposition engineered for self-limiting growth of aluminum oxide thin films", S. F. Szymanski, M. T. Seman, and C. A. Wolden, Surf. Coat. Technol. 201, 8991 (2007). Journal Link

  22. "Optimizing the dielectric performance of TiO2 thin films through control of plasma-enhanced chemical vapor deposition process conditions", J. Vac. Sci. Technol. A 25, 1298 (2007). Journal Link

  23. "Self-limiting growth of tantalum oxide thin films by pulsed plasma-enhanced chemical vapor deposition", M. Seman, J. J. Robbins, S. Agarwal, and C. A. Wolden, Appl. Phys. Lett. 90, 131504 (2007). Journal Link

  24. "Plasma-enhanced chemical vapor deposition of TiO2 thin films for dielectric applications", W. Yang and C. A. Wolden, Thin Solid Films 515, 1708 (2006). Journal Link

  25. "An investigation of annealing on the dielectric performance of TiO2 thin films", W. Yang, J. Marino, A. Monson and C. A. Wolden, Semicond. Sci. Technol. 21, 1573 (2006). Journal Link

  26. "Plasma-assisted co-evaporation of thin film semiconductors", S. Kosaraju, J. A. Harvey, and C. A. Wolden,  Vac. Technol. Coat. 7, 48 (2006). (This paper was the featured story for the issue and it also graced the cover)  Journal Link

  27. "The role of argon in plasma-assisted deposition of indium nitride", S. Kosaraju, J. A. Marino, J. A. Harvey, and C. A. Wolden, J. Cryst. Growth 286, 400 (2006). Journal Link

  28. "Plasma-assisted co-evaporation of b-indium sulfide thin films", S. Kosaraju, J. A. Marino, J. A. Harvey, and C. A. Wolden, Sol. Energy Mater. Sol. Cells, 90, 1121 (2006). Journal Link

  29. "An investigation of the role of plasma conditions on the deposition rate of electrochromic vanadium oxide thin films", M. Seman, J. Marino, W. Yang and C. A. Wolden, J. Non-Cryst. Solid 351, 1987 (2005.) Journal Link

  30. "Formation of chalcogen containing plasmas and their use in the synthesis of photovoltaic absorbers", S. Kosaraju, I. Repins and C. A. Wolden, J. Vac. Sci. Technol. A 23, 1202 (2005). Journal Link

  31. "On the formation and stability of p-type conductivity in nitrogen doped zinc oxide", T. M. Barnes,  K. Olson, and C. A. Wolden, Appl. Phys. Lett. 86, 112112 (2005).  Journal Link

  32. "Real time measurement of hydrogen generated free carriers in polycrystalline ZnO thin films at room temperature", C. A. Wolden, T. M. Barnes, J. B. Baxter, and E. S. Aydil, J. Appl. Phys. 97, 043522 (2005). Journal Link

  33. "Room temperature chemical vapor deposition of c-axis ZnO", T. M. Barnes, J. Leaf, C. Fry, and C. A. Wolden, J. Cryst. Growth 274 412 (2005). Journal Link

  34. "The role of oxygen dissociation in plasma enhanced chemical vapor deposition of zinc oxide from oxygen and diethyl zinc", C. A. Wolden, Plasma Chem. Plasma Process. 25, 169 (2005). Journal Link

  35. "Transport phenomena in high performance nanocrystalline ZnO:Ga films", J. J. Robbins, J. Harvey, J. Leaf, C. Fry, and C. A. Wolden, Thin Solid Films 473, 35 (2005). Journal Link

  36. "A comparison of plasma-activated N2/O2 and N2O/O2 mixtures for use in ZnO:N synthesis by chemical vapor deposition", T. M. Barnes, J. Leaf, S. Hand, C. Fry, and C. A. Wolden, J. Appl. Phys. 96, 7036 (2004). Journal Link

  37. "ZnO synthesis by high vacuum plasma-assisted chemical vapor deposition using dimethylzinc and atomic oxygen", T. M. Barnes, S. Hand, J. Leaf, and C. A. Wolden, J. Vac. Sci. Technol. A 22, 2118 (2004). Journal Link

  38. "An experimental and modeling analysis of vapor transport deposition of cadmium telluride", J. M. Kestner, S. McElvain, S. Kelly, L. M. Woods, T. R. Ohno, and C. A. Wolden, Sol. Energy Mater. Sol. Cells 83, 55 (2004). Journal Link

  39. "Characterization of ion diffusion and transient electrochromic performance in PECVD grown tungsten oxide thin films", M. Seman and C. A. Wolden, Sol. Energy Mater. Sol. Cells 82, 517 (2004)Journal Link

  40. "An interrogation of the zinc oxide-gallium oxide phase space by plasma-enhanced chemical vapor deposition", J. J. Robbins, C. Fry, and C. A. Wolden, J. Cryst. Growth, 263, 283, (2004). Journal Link 

  41. "High mobility oxides: engineered structures to overcome intrinsic performance limitations", J. J. Robbins and C. A. Wolden, Appl. Phys. Lett. 83, 3933, (2003). Journal Link

  42. "An investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide films", M. Seman and C. A. Woldem, J. Vac. Sci. Technol. A 21, 1927 (2003). Journal Link

  43. "An investigation of the plasma chemistry involved in the synthesis of ZnO by plasma-enhanced chemical vapor deposition", J. J. Robbins, J. Esteban, C. Fry, and C. A. Wolden, J. Electrochem. Soc. 150, C693 (2003). Journal Link