PPT Slide

Plasma-enhanced

Chemical Vapor Deposition

(PECVD) of Tin Oxide

Joshua Robbins*, Tyrone Vincent†, & Colin Wolden*

Chemical Engineering* & the Engineering Division†

Colorado School of Mines

We gratefully acknowledge support from NSF through grant award number #9978676. We also acknowledge the support of our industrial partner, Green Development, through the Colorado Photonics and Optoelectronics Program

2000 NSF Design & Manufacturing

Research Conference

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